At the mask center of the concern, made up of the companies Infineon Technologies AG, Advanced Micro Devices (AMD) and DuPont Photomasks, should be developed from 2005 90 and 65 Nanometer lithographic masks as well as other further technologies.
| Project type: | Photomask plant |
| Location: | Germany (Dresden) |
| Investment amount: | 68 million EUR |
| area: | 17,500 m² |
| Investor: | Joint Venture (Infineon Technologies AG, DuPont Photomaske, Inc. AMD Inc. |
| Time period: | 01.01.2002- 31.11.2003 |
| performance: | Global control, time scheduling |
Time scheduling, time control and coordination of the complete project planning, aquisition, execution, activation and approval.
